China Allegedly Has a Prototype EUV Machine Built by Former ASML Workers

A report from Reuters claims that scientists in China have created a prototype machine that could eventually be used to produce semiconductor chips capable of powering artificial intelligence (AI), Ana Washenko reported for Engadget.

China's EUV system was reportedly built by former engineers from Dutch semiconductor supplier ASML. (Photo: ASML Facebook)

Sources told the publication that a team in Shenzhen completed the prototype of an extreme ultraviolet (EUV) lithography machine earlier this year and that it is now undergoing testing.

The EUV system was reportedly built by former engineers from Dutch semiconductor supplier ASML.

According to Reuters, China is targeting production of its own EUV chips beginning in 2028, although other experts project 2030 as a more realistic timeline.

EUV lithography is among the most complex technologies in modern manufacturing.

It sits at the core of advanced chips produced by companies such as Intel and TSMC, meaning any firm hoping to compete at the cutting edge would also need access to EUV capabilities.

While the Chinese prototype is not yet producing chips, it is reportedly capable of generating the extreme ultraviolet light required for semiconductor manufacturing. If confirmed, the development would give China control over critical chipmaking technology much sooner than analysts previously expected.

To date, EUV systems have largely been kept out of reach by Western firms and have served as a geopolitical bargaining chip for the US government.